Low coefficient of thermal expansion Ideal material for UV applications Fused silica is an ideal material for UV applications which is transparent from 155nm to 4.0?m. It is characterized by excellent chemical and radiation resistance, low coefficient of thermal expansion, fluorenscence, and is resistant to scratching. Diameter: -0.1 Wedge Angle: 3 arc minutes Flatness: l/10 at 633nm Surface Quality: 40-20 scratch-dig Uncoated
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