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Ultra Minor Metal Ltd

China Manufacturer with main products: Metal Powder, Precious Metal, Metal Sputtering Target, Spherical Powder, Rare Earth, Scattered Metals

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High Purity Tungsten Target, Tungsten Titanium Sputtering Target

FOB Price: 100.00 - 1000.00 USD/Kilogram
Payment Terms: T/T
In Stock

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Quick Details

  • Chemical Composition: 99.99%
  • Material: W
  • Shape: round
  • Application: sputtering coat
  • Brand Name: W,WTi10

Specifications

Application:

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

 

Specification:

Name

Molecular formula Specification

Size

Relative density Grain size Defect rate
Tungsten target

W

4N(99.99%)

Inch

mm

≥99%

50m

0

5N(99.999%)

D(6,8,10,12)

H(0.25,0.5,0.75)

Diameter 150-350

Thickness 6-25

Tungsten Titanium Target  

4N(99.99%)

≥99%

50m

0

4N5(99.995%)

 High purity Tungsten targetTungsten Titanium Sputtering Target

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